CYCLIC CARBOSILANE DIELECTRIC FILMS

摘要

Embodiments of the invention provide dielectric films and low k dielectric films and methods for making dielectric and low k dielectric films. Dielectric films are made from carbosilane-containing precursors. In embodiments of the invention, dielectric film precursors comprise attached porogen molecules. In further embodiments, dielectric films have nanometer-dimensioned pores.