| 摘要 |
A fluorine gas generation system includes a plurality of fluorine gas supply systems and a controller. Each of the fluorine gas supply systems includes a fluorine gas generation apparatus. Each of the fluorine gas supply systems is connected to a CVD device group. The fluorine gas generation apparatus includes a fluorine gas generator and a buffer tank. An opening/closing valve is inserted through a piping. The other end of the piping is branched into a plurality of pipings. Each of the pipings is connected to CVD devices. Pipings in the adjacent fluorine gas supply systems are connected to each other via a piping. An opening/closing valve is inserted through each of the pipings. |
