SEMICONDUCTOR DEVICE AND ELECTRONIC EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a semiconductor device capable of reducing influences by plasma damage in a production step for a semiconductor device and suppressing variation in a threshold voltage to have a uniform display characteristic.

SOLUTION: A semiconductor device has: a planarized layer provided on a transistor; and a barrier layer provided on an upper surface or a lower surface of the planarized layer, and suppressing diffusion of moisture or degassing components from the planarized layer. By devising a positional relationship between the planarized layer and the barrier layer, a device structure that is effective for reducing plasma damage reaching the planarized layer is used. In addition, by a combination of the device structure and a new structure as a pixel electrode structure, effects such as improvement in the brightness can be also added.

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