| 摘要 |
<P>PROBLEM TO BE SOLVED: To easily maintain and manage irradiation energy of a laser beam, and restrain an irregular shape of an irradiation pattern. <P>SOLUTION: This laser annealing device performs annealing by radiating a plurality of laser beams Lb on an amorphous silicon film formed on a TFT substrate 10. The device comprises a mask 3, on which plural openings with a shape similar to a shape of an annealed area on the TFT substrate 10 are formed; a microlens substrate 4 for collecting the plural laser beams Lb passing through the plural openings of the mask 3 on the TFT substrate 10 via the plural microlenses formed on one surface, and providing constant optical energy to the amorphous silicon film; a pair of guides 25, which are formed into a semi-columnar shape, and opposed to each other at both edge positions across the microlens substrate 4 with axial cores almost in parallel to each other, and whose top parts project nearer the TFT substrate 10 than the positions of the top parts of the microlenses; and a film 22 extending movably between a pair of the guides 25 and transmitting the laser beams Lb. <P>COPYRIGHT: (C)2012,JPO&INPIT |
