发明名称 |
Beam direction sensor and method for determining the angle of incidence of a beam source |
摘要 |
The sensor (1) has a diode arrangement (5) comprising Avalanche-photodiodes (4) representing a position-sensitive detector (3), where the arrangement is arranged in a semiconductor layer (6). An application-specific integrated circuit generates linearly-evaluated analog output signals. A transparent layer i.e. distance layer (8), adjusts defined distance between the semiconductor layer and a cover structure. The structure is arranged on the distance layer and designed as a defined opening in a non-transparent layer. A connection unit electrically connects the sensor to a semiconductor chip. An independent claim is also included for a method for determining incident angle of a radiation source. |
申请公布号 |
EP2469290(A2) |
申请公布日期 |
2012.06.27 |
申请号 |
EP20110194849 |
申请日期 |
2011.12.21 |
申请人 |
SILICON MICRO SENSORS GMBH |
发明人 |
BUSSE, ERIK;PRINZ VON HESSEN, WILHELM |
分类号 |
G01S3/784;G01S3/786;H01L25/00 |
主分类号 |
G01S3/784 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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