发明名称 Beam direction sensor and method for determining the angle of incidence of a beam source
摘要 The sensor (1) has a diode arrangement (5) comprising Avalanche-photodiodes (4) representing a position-sensitive detector (3), where the arrangement is arranged in a semiconductor layer (6). An application-specific integrated circuit generates linearly-evaluated analog output signals. A transparent layer i.e. distance layer (8), adjusts defined distance between the semiconductor layer and a cover structure. The structure is arranged on the distance layer and designed as a defined opening in a non-transparent layer. A connection unit electrically connects the sensor to a semiconductor chip. An independent claim is also included for a method for determining incident angle of a radiation source.
申请公布号 EP2469290(A2) 申请公布日期 2012.06.27
申请号 EP20110194849 申请日期 2011.12.21
申请人 SILICON MICRO SENSORS GMBH 发明人 BUSSE, ERIK;PRINZ VON HESSEN, WILHELM
分类号 G01S3/784;G01S3/786;H01L25/00 主分类号 G01S3/784
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