发明名称 |
APPARATUS AND METHOD FOR MANUFACTURING FINE PATTERN CAPABLE OF INTEROGRAM DIRECTION SWITCHING |
摘要 |
<p>PURPOSE: An apparatus and method for manufacturing a fine pattern capable of changing a polarized light inference pattern direction in a laser scanning mode are provided to manufacture a fine pattern whose line width is reduced by using the interference of polarized light. CONSTITUTION: A polarizing plate polarizes laser light into a S(Secondary) wave and a P(Primary) wave whose polarization directions are vertical. A birefringence plate refracts one of the S wave and the P wave in a specific direction. An analyzer matches the polarization direction of the S wave and the P wave in which a route is divided by the birefringence plate. An exposure lens(110) transmits light in which the polarization direction is matched with and scans the light on a coated sensitive film on a substrate. The polarizing plate, the birefringence plate, the analyzer, and the exposure lens are installed inside an exposure head. An X-stage(120) transfers the exposure head in an X-axis direction. A rotational stage(140) rotates a substrate installation part around a vertical Z-axis.</p> |
申请公布号 |
KR20120068090(A) |
申请公布日期 |
2012.06.27 |
申请号 |
KR20100105062 |
申请日期 |
2010.10.27 |
申请人 |
KOREA RESEARCH INSTITUTE OF STANDARDS AND SCIENCE |
发明人 |
RHEE, HYUG GYO;LEE, YUN WOO |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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