APPARATUS FOR CHEMICAL VAPOR DEPOSITION

摘要

PURPOSE: A chemical vapor deposition apparatus is provided to reduce a failure rate in a process by accurately controlling the heating temperature of a susceptor since foreign materials are prevented from deposited on a heating coil and a sensor. CONSTITUTION: A shower head(130) uniformly sprays a gas provided from a gas supply part(140) to the inside of a chamber(110). A susceptor(150) comprises a substrate support plate(151) supporting a substrate(10), a sidewall(152), and a sidewall supporting plate(153). The susceptor is supported by a rotary shaft(160). A heater(170) comprises a heating coil(171), a heat sink(172), and a power block(173). A liner(111) is installed between an inner wall of the chamber and an outer sidewall of the susceptor.