发明名称 TUNNELING FIELD EFFECT TRANSISTOR WITH ASYMMETRICAL ACTIVE REGION
摘要 <p>PURPOSE: A tunneling field effect transistor with an asymmetrical active region is provided to increase a tunneling current in a turn-on state and maximally suppress a leakage current in a turn-off state. CONSTITUTION: A gate(40) is formed on a semiconductor substrate while interposing a gate insulation layer(32). An active region includes a P+ region(22), a channel region(20a), and an N+ region(24). The channel region is formed on a buried oxide layer(10). The channel region forms an N channel TFET. The P+ region and the N+ region are formed on the semiconductor substrate while interposing the channel region.</p>
申请公布号 KR20120066150(A) 申请公布日期 2012.06.22
申请号 KR20100127357 申请日期 2010.12.14
申请人 INDUSTRY-UNIVERSITY COOPERATION FOUNDATION SOGANGUNIVERSITY 发明人 CHOI, WOO YOUNG
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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