发明名称 Lithographic Apparatus and Device Manufacturing Method
摘要 A lithography apparatus comprises a projection system arranged to transfer a pattern from a patterning device onto a substrate, a carrier, and a drive system for moving the carrier relative to the projection system in a plane defined by reference to orthogonal axes X and Y. The drive system comprises a shuttle moving parallel to the Y-axis, a shuttle connector connecting the shuttle to the carrier, the shuttle connector allowing movement of the carrier in a direction parallel to the X-axis relative to the shuttle, and a shuttle driver for driving movement of the shuttle parallel to the Y-axis. The shuttle is located to one side of the carrier in a direction parallel to the X-axis and it is desirable if only one of the shuttle is connected to the carrier.
申请公布号 US2012153543(A1) 申请公布日期 2012.06.21
申请号 US201113296571 申请日期 2011.11.15
申请人 VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS;DE GROOT ANTONIUS FRANCISCUS JOHANNES;CADEE THEODORUS PETRUS MARIA;DE BOEIJ JEROEN;ASML NETHERLANDS B.V. 发明人 VERMEULEN JOHANNES PETRUS MARTINUS BERNARDUS;DE GROOT ANTONIUS FRANCISCUS JOHANNES;CADEE THEODORUS PETRUS MARIA;DE BOEIJ JEROEN
分类号 B29C67/00;B23K26/36 主分类号 B29C67/00
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