发明名称 SEMICONDUCTOR DEVICES AND METHODS OF FABRICATING THE SAME
摘要 A semiconductor device includes a substrate, a device isolation layer at the substrate and defining an active region, and a gate electrode on the substrate and extending across the active region. The active region includes a first active region and a second active region, and the first and second active regions are arranged at opposing sides of a centerline of the gate electrode. At least one of the first and second active regions has a width decreasing from a region outside the gate electrode toward the centerline of the gate electrode, and the first and second active regions are asymmetric with respect to the centerline of the gate electrode.
申请公布号 US2012153403(A1) 申请公布日期 2012.06.21
申请号 US201113292508 申请日期 2011.11.09
申请人 发明人 PARK MIN-CHUL;YANG GIYOUNG;YOO HANEUL
分类号 H01L29/78 主分类号 H01L29/78
代理机构 代理人
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