发明名称 WAFER-LEVEL LENS, WAFER-LEVEL LENS PRODUCTION METHOD, AND IMAGING UNIT
摘要 A sufficient light-shielding property is obtained by a wafer level lens having at least one lens module having a substrate and a plurality of lenses formed on the substrate in which the wafer level lens has a black resist layer formed on the surface of the lens module or on the surface of the substrate and the black resist layer is formed with a pattern having an opening at a part intersecting the optical axis of the lens, and generation of defects such as ghosts, flares and the like due to a reflected light can be prevented and an increase in the production cost can be suppressed.
申请公布号 EP2466341(A1) 申请公布日期 2012.06.20
申请号 EP20100808250 申请日期 2010.08.12
申请人 FUJIFILM CORPORATION 发明人 MARUYAMA, YOICHI
分类号 G02B3/00;G02B7/02;G02B13/00;G02B13/18 主分类号 G02B3/00
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