发明名称 |
WAFER-LEVEL LENS, WAFER-LEVEL LENS PRODUCTION METHOD, AND IMAGING UNIT |
摘要 |
A sufficient light-shielding property is obtained by a wafer level lens having at least one lens module having a substrate and a plurality of lenses formed on the substrate in which the wafer level lens has a black resist layer formed on the surface of the lens module or on the surface of the substrate and the black resist layer is formed with a pattern having an opening at a part intersecting the optical axis of the lens, and generation of defects such as ghosts, flares and the like due to a reflected light can be prevented and an increase in the production cost can be suppressed. |
申请公布号 |
EP2466341(A1) |
申请公布日期 |
2012.06.20 |
申请号 |
EP20100808250 |
申请日期 |
2010.08.12 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
MARUYAMA, YOICHI |
分类号 |
G02B3/00;G02B7/02;G02B13/00;G02B13/18 |
主分类号 |
G02B3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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