发明名称 |
Wet developable bottom antireflective coating composition and method for use thereof |
摘要 |
The present invention discloses an antireflective coating composition for applying between a substrate surface and a positive photoresist composition. The antireflective coating composition is developable in an aqueous alkaline developer. The antireflective coating composition comprises a polymer, which comprises at least one monomer unit containing one or more moieties selected from the group consisting of a lactone, maleimide, and an N-alkyl maleimide; and at least one monomer unit containing one or more absorbing moieties. The polymer does not comprise an acid labile group. The present invention also discloses a method of forming and transferring a relief image by using the inventive antireflective coating composition in photolithography.
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申请公布号 |
US8202678(B2) |
申请公布日期 |
2012.06.19 |
申请号 |
US20090478442 |
申请日期 |
2009.06.04 |
申请人 |
CHEN KUANG-JUNG J.;KHOJASTEH MAHMOUD;KWONG RANEE WAI-LING;LAWSON MARGARET C.;LI WENJIE;PATEL KAUSHAL S.;VARANASI PUSHKARA R.;INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
CHEN KUANG-JUNG J.;KHOJASTEH MAHMOUD;KWONG RANEE WAI-LING;LAWSON MARGARET C.;LI WENJIE;PATEL KAUSHAL S.;VARANASI PUSHKARA R. |
分类号 |
G03F7/09;G03C1/825;G03F7/20;G03F7/30;G03F7/36 |
主分类号 |
G03F7/09 |
代理机构 |
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代理人 |
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地址 |
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