Photolithography systems and associated methods of focus correction

摘要

Several embodiments of photolithography systems and associated methods of focus correction are disclosed herein. In one embodiment, a method for characterizing focus errors in a photolithography system includes placing a microelectronic substrate onto a substrate support of the photolithography system. The microelectronic substrate is divided into a plurality of fields individually partitioned into a plurality of regions. The method also includes developing a raw focus error map that has a focus error corresponding to the individual regions of the plurality of fields and deriving at least one of an inter-field focus error map and an intra-field focus error map based on the raw focus error map. The inter-field focus error map has an inter-field focus error corresponding to the individual fields, and the intra-field focus error map has an intra-field focus error corresponding to the individual regions.