RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, AND NEW COMPOUND

摘要

PURPOSE: A resist composition, a method for forming resist patterns, and noble compounds are provided to improve the rectangularity and the resolution of the resist patterns. CONSTITUTION: A resist composition includes a base material, a nitrogen-containing organic compound, and an acid generating agent. The acid generating agent generates acid by exposure. The dissolution of the base material to a developing solution is changed by the action of acid. The nitrogen-containing organic compound contains a compound represented by chemical formula 1. The acid generating agent excludes the compound represented by chemical formula 1. In chemical formula 1, RN is nitrogen-containing heterocyclic group with/without a substituted group; X0 is a C1 to C10 linear or branched divalent aliphatic hydrocarbon group, a C3 to C20 cyclic or partially cyclic divalent aliphatic hydrocarbon group, or a group in which a part or whole of hydrogen atoms of the preceding hydrocarbon groups is substituted with fluorine atoms; and M^+ is organic cation.