| 摘要 |
The invention provides a probe thin film used for a probe block and a manufacturing method thereof. The manufacturing method for the probe thin film used for a probe block comprises: a probe part forming step, in the step, photoetching is used to form a plurality of probe parts together on a substrate according to a set spacing, the plurality of probe parts respectively comprise a signal line part and a contact bump formed via protrusion from the signal line part; a thin film joining step, in the step, the upper surface of the probe part joins with the thin film part; and a substrate removing step, in the step, the substrate is removed. |
