发明名称 |
PROCESS FOR MANUFACTURING ELECTRO-MECHANICAL SYSTEMS |
摘要 |
<p>A method of avoiding stiction during vapor hydrofluoride (VHF) release of a microelectromechanical system (MEMS) or nanoelectromechanical system (NEMS) composed of a mechanical device and a substrate is described. A silicon nitride layer is provided between the substrate and a sacrificial oxide layer and/or between a device layer and the sacrificial oxide layer, and/or on a side of the device layer facing away from the sacrificial oxide layer, and converted to thicker ammonium hexafluorosilicate with VHF while simultaneously removing a portion of the sacrificial oxide. The ammonium hexafluorosilicate acts as a temporary support, shim, wedge, or tether which limits device movement during fabrication and is later removed by sublimation under heat and/or reduced pressure.</p> |
申请公布号 |
WO2012078139(A1) |
申请公布日期 |
2012.06.14 |
申请号 |
WO2010US59238 |
申请日期 |
2010.12.07 |
申请人 |
PRIMAXX, INC.;VESTYCK, DANIEL, J. |
发明人 |
VESTYCK, DANIEL, J. |
分类号 |
B81C1/00;B81B7/02;C23C16/40;C23C16/44 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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