发明名称 AIR GAP FORMATION
摘要 A method of forming air gaps between adjacent raised features on a substrate includes forming a carbon-containing material in a bottom region between the adjacent raised features using a flowable deposition process. The method also includes forming a silicon-containing film over the carbon-containing material using a flowable deposition process, where the silicon-containing film fills an upper region between the adjacent raised features and extends over the adjacent raised features. The method also includes curing the carbon-containing material and the silicon-containing material at an elevated temperature for a period of time to form the air gaps between the adjacent raised features.
申请公布号 WO2012039982(A3) 申请公布日期 2012.06.14
申请号 WO2011US51226 申请日期 2011.09.12
申请人 APPLIED MATERIALS, INC.;MALLICK, ABHIJIT BASU;INGLE, NITIN, K. 发明人 MALLICK, ABHIJIT BASU;INGLE, NITIN, K.
分类号 H01L21/31;H01L21/205 主分类号 H01L21/31
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