发明名称 |
System and method for improving immersion scanner overlay performance |
摘要 |
System and method for improving immersion scanner overlay performance are described. One embodiment is a method of improving overlay performance of an photolithography immersion scanner including a wafer table having lens cooling water (“LCW”) disposed in a water channel therein, the wafer table having an input for receiving the LCW into the water channel and an output for expelling the LCW from the water channel. The method includes providing a water tank that connects to at least one of the wafer table input and the wafer table output; monitoring a pressure of water in the water tank; and maintaining the pressure of the water in the water tank at a predetermined level. |
申请公布号 |
US8199314(B2) |
申请公布日期 |
2012.06.12 |
申请号 |
US201113288133 |
申请日期 |
2011.11.03 |
申请人 |
PENG JUI-CHUNG;FU TZUNG-CHI;LIN CHIN-HSIANG;LIN CHIEN-HSUN;LIN CHUN-HUNG;GUO YAO-WEN;LIN SHY-JAY;LIU HENG-HSIN;TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. |
发明人 |
PENG JUI-CHUNG;FU TZUNG-CHI;LIN CHIN-HSIANG;LIN CHIEN-HSUN;LIN CHUN-HUNG;GUO YAO-WEN;LIN SHY-JAY;LIU HENG-HSIN |
分类号 |
G03B27/52;B81C99/00;G03B27/32;G03B27/42;G03B27/58;G03B27/60;G03B27/68 |
主分类号 |
G03B27/52 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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