发明名称 Semiconductor device having improved layout of ESD device
摘要 PURPOSE: A semiconductor device having an improved layout of an ESD(Electrostatic-Sensitive Device) is provided to supply a larger ESD through wider area since an ESD is produced in a common area by sharing a lower area of two ore more adjacent pads. CONSTITUTION: A first ESD(Electrostatic-Sensitive Device) includes a first P-type diode(511a) and a first N-type diode(511b) connected to a first pad. A second ESD includes a second P-type diode(512a) and a second N-type diode(512b) connected to a second pad. The first ESD and the second ESD are formed in a common area(510) sharing lower portions of the first pad and the second pad. First ESD protective resistance is formed on the top of the first P-type diode and the second P-type diode. Second ESD protective resistance is formed on upper portion of the first ESD protective resistance.
申请公布号 KR20120059715(A) 申请公布日期 2012.06.11
申请号 KR20100121108 申请日期 2010.12.01
申请人 SILICON WORKS CO., LTD. 发明人 CHOI, JOUNG CHEUL;JUNG, KI RYONG;NA, JOON HO
分类号 H01L27/04 主分类号 H01L27/04
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