发明名称 |
Semiconductor device having improved layout of ESD device |
摘要 |
PURPOSE: A semiconductor device having an improved layout of an ESD(Electrostatic-Sensitive Device) is provided to supply a larger ESD through wider area since an ESD is produced in a common area by sharing a lower area of two ore more adjacent pads. CONSTITUTION: A first ESD(Electrostatic-Sensitive Device) includes a first P-type diode(511a) and a first N-type diode(511b) connected to a first pad. A second ESD includes a second P-type diode(512a) and a second N-type diode(512b) connected to a second pad. The first ESD and the second ESD are formed in a common area(510) sharing lower portions of the first pad and the second pad. First ESD protective resistance is formed on the top of the first P-type diode and the second P-type diode. Second ESD protective resistance is formed on upper portion of the first ESD protective resistance.
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申请公布号 |
KR20120059715(A) |
申请公布日期 |
2012.06.11 |
申请号 |
KR20100121108 |
申请日期 |
2010.12.01 |
申请人 |
SILICON WORKS CO., LTD. |
发明人 |
CHOI, JOUNG CHEUL;JUNG, KI RYONG;NA, JOON HO |
分类号 |
H01L27/04 |
主分类号 |
H01L27/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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