| 摘要 |
PURPOSE: A developing apparatus, a developing method, and memory media are provided to increase the reactivity of developing liquid and resist in a specific region of a substrate. CONSTITUTION: A developing apparatus includes a substrate loading and supporting part(11), a developing liquid supplying part, a radiation light irradiating part, and a washing liquid supplying part(71). Resist is applied on the surface of the substrate loading and supporting part. The substrate loading and supporting part horizontally loads and supports a substrate after exposure. The developing liquid supplying part supplies developing liquid to the surface of the substrate. The developing liquid supplying part develops the resist. The developing liquid on the specific region of the substrate is heated to improve the reactivity of the developing liquid to the resist by irradiating radiation light with a substrate material wavelength absorbing region. The washing liquid supplying part supplies washing liquid to the surface of the substrate to eliminate the developing liquid. |
