发明名称 DRAWING APPARATUS AND METHOD OF CONTROLLING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a drawing apparatus that can partially adjust wettability according to a constitution of an image in order to enable free drawing expression, and to provide a method of controlling the drawing apparatus. <P>SOLUTION: The drawing apparatus includes: a carriage unit 9 which selectively discharges the substrate material from a plurality of discharge nozzles 21 and performs substrate coating processing about wettability to a workpiece W, while selectively discharging the ink material for drawing from a plurality of discharge nozzles 21, and carrying out drawing processing of the image at the workpiece W, while scanning relatively an inkjet head 18 which has a plurality of discharge nozzles 21 which carry out discharge of the ink material for drawing to the workpiece W; an ultraviolet irradiation device 19 which carries out fixing processing by making the substrate material cured which is carried out substrate coating processing; and a control device 10 which controls the carriage unit 9 and the ultraviolet irradiation device 19. The control device 10 performs the fixing processing while performing substrate coating processing according to the constitution of the image to be carried out drawing processing in advance to the drawing processing. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012106362(A) 申请公布日期 2012.06.07
申请号 JP20100255549 申请日期 2010.11.16
申请人 SEIKO EPSON CORP 发明人 KUBOTA ASAKO;NOZAWA RYOICHI;ITO TATSUYA;ISHIZUKA HIROTAKA
分类号 B41J2/01 主分类号 B41J2/01
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