| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a preparation method of rinse liquid desirable for rinse treatment depending on the properties of a processing surface of a silicon wafer. <P>SOLUTION: An amount of a contamination prevention material in rinse liquid prepared by adding the contamination prevention material to ultrapure water is determined depending on an expected adsorption amount of a metal impurity to a silicon wafer obtained from the analysis vale of an amount of an adsorption active point that exists in the surface of a silicon wafer in a specific condition, an adsorption amount of a metal impurity when the surface of the silicon wafer is cleaned in the specific condition, and the analysis vale of an amount of an adsorption active point that exists in the surface of a silicon wafer after the condition is changed. <P>COPYRIGHT: (C)2012,JPO&INPIT |
