发明名称 WAFER MOLD MATERIAL AND METHOD FOR MANUFACTURING SEMICONDUCTOR APPARATUS
摘要 The invention provides a wafer mold material for collectively subjecting a wafer having semiconductor devices on a surface thereof to resin molding, wherein the wafer mold material has a resin layer containing a filler and at least any one of an acrylic resin, a silicone resin having an epoxy group, an urethane resin, and a polyimide silicone resin, and the wafer mold material is formed into a film-like shape. There can be a wafer mold material that enables collective molding (wafer molding) with respect to a wafer having semiconductor devices formed thereon, has excellent transference performance with respect to a large-diameter thin-film wafer, can provide a flexible hardened material with low-stress properties, and can be preferably used as a mold material in a wafer level package with less warp of a formed (molded) wafer.
申请公布号 US2012139131(A1) 申请公布日期 2012.06.07
申请号 US201113296648 申请日期 2011.11.15
申请人 SHIN-ETSU CHEMICAL CO., LTD. 发明人 SUGO MICHIHIRO;KONDO KAZUNORI;KATO HIDETO
分类号 H01L23/28;H01L21/78 主分类号 H01L23/28
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