| 摘要 |
A resist developing device (1) of the present invention comprises: a storage unit (4) which is kept at a constant temperature for storing a developing solution (11); a holder unit (8) for holding a substrate (6) to be processed; a supply tube (5) which forms a flow passage for the developing solution (11) stored in the storage unit (4), and includes an outlet (14) at an end of the flow passage to discharge the developing solution (11) toward the substrate (6) to be processed; a pump (16) for pumping the developing solution (11) to the flow passage formed by the supply tube (5); and a pressure adjusting device (20) which can switch the pressure applied from the pump (16) to the developing solution (11) in the supply tube (5) between a first pressure and a second pressure. At the first pressure, the developing solution (11) discharged through the outlet (14) reaches a place other than the substrate (6) to be processed. At the second pressure, the developing solution (11) discharged through the outlet (14) reaches the substrate (6) to be processed. |
