| 摘要 |
A method of fabricating a patterned retarder includes: forming a retarder material layer on a substrate by coating a retarder material; irradiating a first polarized UV ray onto the retarder material layer, the first polarized UV ray having a first polarization axis; irradiating a second polarized UV ray onto the retarder material layer, the second polarized UV ray having a second polarization axis perpendicular to the first polarization axis; and baking the retarder material layer to form first and second oriented patterns alternating with each other, each of the first and second oriented patterns having an anisotropic property. |
