发明名称 COMPOUND SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
摘要 A compound semiconductor device includes a substrate; an initial layer formed over the substrate; and a core layer which is formed over the initial layer and contains a Group III-V compound semiconductor. The initial layer is a layer of Group III atoms of the Group III-V compound semiconductor contained in the core layer.
申请公布号 US2012138955(A1) 申请公布日期 2012.06.07
申请号 US201113289314 申请日期 2011.11.04
申请人 ISHIGURO TETSURO;YAMADA ATSUSHI;FUJITSU LIMITED 发明人 ISHIGURO TETSURO;YAMADA ATSUSHI
分类号 H01L29/16;H01L21/20;H01L29/201 主分类号 H01L29/16
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