PATTERNABLE LOW-K DIELECTRIC INTERCONNECT STRUCTURE WITH A GRADED CAP LAYER AND METHOD OF FABRICATION,申请号GB20120000146-传众专利搜索

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发明名称	PATTERNABLE LOW-K DIELECTRIC INTERCONNECT STRUCTURE WITH A GRADED CAP LAYER AND METHOD OF FABRICATION
摘要
申请公布号	GB2486078(A)	申请公布日期	2012.06.06
申请号	GB20120000146	申请日期	2010.08.23
申请人	INTERNATIONAL BUSINESS MACHINES CORPORATION	发明人	QINGHUANG LIN;DEBORAH ANN NEUMAYER
分类号	H01L21/768;H01L21/312	主分类号	H01L21/768
代理机构		代理人
主权项
地址

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