发明名称 |
Lithographic apparatus and method |
摘要 |
A lithographic apparatus includes an illumination system configured to condition a beam of radiation, a support structure configured to hold a reticle, a substrate table configured to hold a substrate, and a projection system configured to project a beam onto the substrate table. The numerical aperture of the illumination system is larger than the numerical aperture of the projection system. The apparatus also includes a radiation redirection device configured to re-direct &sgr;>1 components of the beam of radiation to within the numerical aperture of the projection system. |
申请公布号 |
US8194231(B2) |
申请公布日期 |
2012.06.05 |
申请号 |
US20080241790 |
申请日期 |
2008.09.30 |
申请人 |
MULDER HEINE MELLE;HAGEMAN JOOST CYRILLUS LAMBERT;STAS ROLAND JOHANNES WILHELMUS;ASML NETHERLANDS B.V. |
发明人 |
MULDER HEINE MELLE;HAGEMAN JOOST CYRILLUS LAMBERT;STAS ROLAND JOHANNES WILHELMUS |
分类号 |
G03B27/54;G03B27/42;G03B27/68 |
主分类号 |
G03B27/54 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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