发明名称 REFINING METHOD AND REFINING APPARATUS FOR ARGON GAS
摘要 <P>PROBLEM TO BE SOLVED: To provide a refining method and a refining device, both practically removing impurities contained in a recovered argon gas to provide a high purity argon gas without requiring a large amount of energy. <P>SOLUTION: In refining an argon gas at least including oxygen, hydrogen, carbon monoxide and nitrogen as impurities, when an oxygen mol concentration in the argon gas is a value equal to or lower than 1/2 of the sum of the carbon monoxide mol concentration and hydrogen mol concentration, the value is set to higher than 1/2 of the sum by addition of oxygen. Then, oxygen in the argon gas is reacted with the carbon monoxide and hydrogen using a catalyst to generate carbon dioxide and water in such a state that the oxygen remains. At least the oxygen, carbon dioxide, nitrogen and moisture in the argon gas are adsorbed to an adsorbent by a pressure swing adsorption process at normal temperature. As the adsorbent, LiX type synthetic zeolite and a carbon molecular sieve having a pore diameter distribution in which the peak of the pore diameter is observed between 0.35 nm and 0.55 nm are used. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012101976(A) 申请公布日期 2012.05.31
申请号 JP20100251607 申请日期 2010.11.10
申请人 SUMITOMO SEIKA CHEM CO LTD 发明人 KISHII MITSURU;SASANO HIROAKI;SHIMA KOICHI;KITAGISHI NOBUYUKI
分类号 C01B23/00;B01D53/04;B01J20/20 主分类号 C01B23/00
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