| 摘要 |
Disclosed are a photo-acid generator having high developing properties, a cationic polymerization initiator having high curing properties, and a resist composition and a cationically polymerizable composition containing the photo-acid generator and the cationic polymerization initiator, respectively. Described are a noble aromatic sulfonium salt compound of general formula (I) and a photo-acid generator, a cationic polymerization initiator, a resist composition, and a cationically polymerizable composition containing the compound. In formula (I), R1 to R10 are each an optionally substituted C1-C18 alkyl, etc.; R11 to R17 are each an optionally substituted C1-C18 alkyl, etc.; R18 is an optionally substituted C1-C18 alkyl, etc.; and X1− is a monovalent anion. |
