| 摘要 |
<p>A method for manufacturing a display device provided with gate wiring (112) that is disposed on a substrate to supply a signal to a TFT, and a plurality of source wirings (111) disposed on the upper side thereof, the method for manufacturing a display device including: a step for forming a first conductive pattern (31) that includes the gate wiring (112) by etching a gate metal layer with a first resist pattern as a mask; and a step wherein in a state where a second resist pattern (12) has been formed such that at the portions located between the source wirings (111) a part of the upper end part of the first conductive pattern (31) is exposed and the other parts thereof are covered, at the aforementioned part of the upper end part, the first conductive pattern (31) is etched off from the upper surface part way through in the direction of thickness.</p> |
