发明名称 |
SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a semiconductor device with improved temperature dependence of withstand voltage characteristics and to provide a method of manufacturing the semiconductor device. <P>SOLUTION: In a semiconductor device, in order for electrons reaching from an N-type semiconductor region N4 not to increase in a depletion region DL formed when a large voltage with respect to a cathode terminal T1 is applied to an anode terminal T2, the N-type semiconductor region N4 is configured such that high-concentration N-type semiconductor regions N4a containing an impurity in high concentration and low-concentration N-type semiconductor regions N4b containing an impurity in low concentration compared to the high-concentration N-type semiconductor regions N4a are alternately disposed. <P>COPYRIGHT: (C)2012,JPO&INPIT |
申请公布号 |
JP2012104563(A) |
申请公布日期 |
2012.05.31 |
申请号 |
JP20100249985 |
申请日期 |
2010.11.08 |
申请人 |
SHINDENGEN ELECTRIC MFG CO LTD |
发明人 |
SUZUKI YASUTERU;SHIBATA YUKIHIRO |
分类号 |
H01L29/87;H01L21/329;H01L29/74;H01L29/744;H01L29/747;H01L29/861 |
主分类号 |
H01L29/87 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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