DEFLECTOR ARRAY, CHARGED PARTICLE LITHOGRAPHY APPARATUS, METHOD OF MANUFACTURING DEVICE, METHOD OF MANUFACTURING DEFLECTOR ARRAY

摘要

PROBLEM TO BE SOLVED: To solve such a problem that the yield worsens in the manufacture of a blanking deflector array when the number of charged particle beams increases.

SOLUTION: The deflector array comprises a base substrate in which multiple openings are formed, and a multiple deflector chips having multiple electrode pairs provided on both sides of at least some openings out of the multiple openings. Furthermore, the multiple deflector chips are fixed to one base substrate so that the multiple openings of the deflector chips are arranged at positions corresponding to the multiple openings of the base substrate.

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