| 发明名称 |
PROCESS CHAMBER COMPONENT HAVING YTTRIUM-ALUMINUM COATING |
| 摘要 |
A substrate processing chamber component comprising a chamber component structure having an yttrium-aluminum coating. The yttrium-aluminum coating comprises a compositional gradient through a thickness of the coating.
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| 申请公布号 |
US2012135155(A1) |
申请公布日期 |
2012.05.31 |
| 申请号 |
US201213368255 |
申请日期 |
2012.02.07 |
| 申请人 |
HAN NIANCI;XU LI;SHIH HONG;APPLIED MATERIALS, INC. |
发明人 |
HAN NIANCI;XU LI;SHIH HONG |
| 分类号 |
C23C4/10;B05C11/00;C23C16/44;H01J37/32 |
主分类号 |
C23C4/10 |
| 代理机构 |
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