| 摘要 |
<P>PROBLEM TO BE SOLVED: To increase a stable operating range of active damping. <P>SOLUTION: A lithographic apparatus includes an illumination system configured to condition a radiation beam, and a support constructed to support a patterning device. The lithographic apparatus further includes a substrate table constructed to hold a substrate, and a projection system configured to project the patterned beam onto a target portion of the substrate. An active damping system is provided to damp a vibration of at least part of the projection system. The active damping system includes a combination of a sensor to measure a position quantity of the projection system and an actuator to exert a force on the projection system in dependency on a signal provided by the sensor. The active damping system is connected to a damping mass, which is connected to the projection system. <P>COPYRIGHT: (C)2012,JPO&INPIT |
