ILLUMINATION SYSTEM FOR MICROLITHOGRAPHIC EXPOSURE APPARATUS

摘要

PROBLEM TO BE SOLVED: To provide an improved condenser for an illumination system for a microlithographic exposure apparatus.

SOLUTION: An illumination system of a microlithographic exposure apparatus comprises a condenser 601 for transforming a pupil plane 54 into a field plane 62. The condenser 601 comprises: a first lens formed as a thin planar plate L11; a second lens L12 formed as a negative meniscus lens having an aspherical concave rear surface; a third lens L13 formed as a positive meniscus lens having an aspherical convex rear surface; a fourth lens L14 formed as a bi-convex lens that also has an aspherical convex rear surface; a fifth lens L15 formed as a positive meniscus lens with a concave rear surface; a sixth lens L16 formed as a planar concave lens; and a seventh lens L17 which is the last lens and formed as a positive meniscus lens with a slightly concave front surface.

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