发明名称 METHOD FOR MEASURING IMPURITY IN SILICON
摘要 <P>PROBLEM TO BE SOLVED: To provide a method for measuring utilizing dilution of content of impurity in silicon by a float zone method for enabling measurement of the impurity in the silicon to be inspected using photoluminescence or FTIR or both of them. <P>SOLUTION: A single crystal rod is made from the silicon to be inspected by a zone pulling-up method, the single crystal rod in introduced into a sleeve of single crystal or polycrystal silicon having specified carbon content and dopant content in at least one time dilution step, a diluted silicon single crystal rod is made from the rod or the sleeve by the zone pulling-up method, and in the method for measuring the impurity in the silicon, the measurement of the impurity in the silicon to be inspected is carried out using the photoluminescence or the FTIR or both of them based on the diluted single crystal rod. <P>COPYRIGHT: (C)2012,JPO&INPIT
申请公布号 JP2012102009(A) 申请公布日期 2012.05.31
申请号 JP20110245758 申请日期 2011.11.09
申请人 WACKER CHEMIE AG 发明人 BONAUER-KLEPP KURT
分类号 C30B29/06;C01B33/02;C30B13/04 主分类号 C30B29/06
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