| 摘要 |
<p>PURPOSE: A substrate processing apparatus and a method thereof are provided to reduce substrate process time by separately operating each part by dividing a unit which has a slope control function among substrate transfer units. CONSTITUTION: A cleaning process is performed with respect to a substrate in a cleaning process section. The cleaning process section is a section for a process performed in a single chamber. A substrate transfer unit(360) transfers the substrate in a first direction within the cleaning process section. The substrate transfer unit is divided in to two or more parts in the first direction. The divided part changes a slope of the substrate.</p> |
