| 摘要 |
<p>The present invention relates to a method for measuring small angle X-ray scattering, comprising the following steps of generating X-ray by an X-ray generating apparatus (11); forming the X-ray generated from said X-ray generating apparatus (11) into a predetermined incident beam of X-ray through an optic system (12-16); irradiating said formed incident beam of X-ray upon a sample mounted on a sample holder portion (120); and detecting small angle scattered X-ray from said sample by an X-ray detector (18), wherein upon said sample, which is formed to be a thin film on a surface of a laminar substrate, said incident beam of X-ray is incident from side-end surface thereof, at an incident angle having a negative angle with respect to a surface of said sample formed to be the thin film.</p> |
