发明名称 |
Electroplating device, and process for electroplating work using the device |
摘要 |
<p>The present invention provides an electroplating device including an anode inserted through and disposed in a hole provided in a work and communicating with the outside, and a member for rotating the work about its center axis and supplying a plating electric current to the work. The present invention also provides an electroplating device including an anode inserted through and disposed in a hole provided in a work and communicating with the outside, a member for rotating the work about its center axis, and a member for supplying a plating electric current to the work. Further, the present invention provides an electroplating device including an anode inserted through and disposed in a hole provided in a work and communicating with the outside, and a means for allowing a plating solution in the hole in the work to flow. Thus, a uniform plated film can be formed on both of the outer and inner surfaces of the work having the hole communicating with the outside such as a ring-shaped work, of which a ring-shaped bonded magnet is representative, by using the electroplating device. <IMAGE></p> |
申请公布号 |
EP1070772(B1) |
申请公布日期 |
2012.05.30 |
申请号 |
EP20000113496 |
申请日期 |
2000.06.26 |
申请人 |
HITACHI METALS, LTD. |
发明人 |
YOSHIMURA, KOHSHI;NISHIUCHI, TAKESHI;KIKUI, FUMIAKI;ASANO, MASAHIRO;ISOZAKI, TAKAHIRO |
分类号 |
C25D7/00;H01F41/02;C25D3/00;C25D7/04;C25D17/12;C25D17/16;C25D21/00;C25D21/10;H01F7/02;H02K1/17;H02K1/27;H02K15/03 |
主分类号 |
C25D7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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