发明名称 |
THIN FILM FORMING APPARATUS |
摘要 |
<p>A thin film deposition apparatus (1) of the present invention includes a vacuum container (11) for maintaining a vacuum therein, gas introduction means (76) for introducing a reactive gas into the vacuum container (11), and plasma generating means (61) for generating a plasma of the reactive gas within the vacuum container (11).</p> |
申请公布号 |
EP1637624(B1) |
申请公布日期 |
2012.05.30 |
申请号 |
EP20030733231 |
申请日期 |
2003.06.02 |
申请人 |
SHINCRON CO., LTD. |
发明人 |
SONG, YIZHOU;SAKURAI, TAKESHI;MURATA, TAKANORI |
分类号 |
C23C14/34;C23C14/00;C23C14/08;C23C14/10;C23C14/35;C23C14/56;C23C14/58;C23C16/44;C23C16/50;C23F4/00;H01J37/32;H01L21/31;H01L21/318;H05H1/46 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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