发明名称 VCSEL semiconductor device
摘要 A vertical surface emitting laser having a mesa structure formed with sloping side walls. A passivation layer including at least two sublayers at least partially covers the mesa structure. The at least two sublayers have differing stress components arranged to at least partially counter each other. By making the mesa structure with sloping side walls, the deposition of the passivation layer in such a way as to minimize the net stress of the passivation layer is facilitated. In addition, the mesa structure has a first stack of mirror layers comprising a semiconductor material doped with a first dopant and having first peripheral oxidized portions extending a first distance into said first stack, and a second stack of mirror layers comprising a semiconductor material doped with a second dopant and having second peripheral oxidized portions extending a second distance into said second stack, wherein the first distance is different from the second distance. By controlling the first distance and the second distance appropriately, the internal stress in the mesa structure can be reduced.
申请公布号 US8189642(B1) 申请公布日期 2012.05.29
申请号 US20100710173 申请日期 2010.02.22
申请人 LI NEIN-YI;XIE CHUAN;LEI CHUN;CARSON RICHARD F.;EMCORE CORPORATION 发明人 LI NEIN-YI;XIE CHUAN;LEI CHUN;CARSON RICHARD F.
分类号 H01S5/00 主分类号 H01S5/00
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