| 发明名称 |
A METHOD OF PRODUCING A POROUS SEMICONDUCTOR FILM ON A SUBSTRATE |
| 摘要 |
<p>The invention relates to a method of producing a porous semiconductor film and the film resulting from such production. It furthermore relates to an electronic device incorporating such film and to potential uses of such film.</p> |
| 申请公布号 |
KR101149111(B1) |
申请公布日期 |
2012.05.25 |
| 申请号 |
KR20067021832 |
申请日期 |
2005.01.17 |
| 申请人 |
|
发明人 |
|
| 分类号 |
H01L31/042;H01G9/20;H01L31/18;H01L51/40 |
主分类号 |
H01L31/042 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
