发明名称 |
LIQUID PROCESSING METHOD, LIQUID PROCESSING APPARATUS AND STORAGE MEDIUM STORING PROGRAM FOR PERFORMING LIQUID PROCESSING METHOD |
摘要 |
There are provided a liquid processing method and a liquid processing apparatus capable of removing a resist film without removing an underlying film when removing the resist film from a substrate on which the underlying film and the resist film are formed in sequence from the bottom and into which ions have been previously implanted. In the liquid processing method capable of processing a substrate by a processing solution, the method includes removing the resist film from the substrate by supplying the processing solution at a temperature of about 120° C. or higher to the substrate. The processing solution includes a sulfuric acid and a nitric acid at a preset ratio, and the substrate has thereon the underlying film and the resist film formed on the underlying film, and ions have been previously implanted into the substrate. |
申请公布号 |
US2012125368(A1) |
申请公布日期 |
2012.05.24 |
申请号 |
US201113300739 |
申请日期 |
2011.11.21 |
申请人 |
KANEKO MIYAKO;FUJII YASUSHI;SEKIGUCHI KENJI;TOKYO ELECTRON LIMITED |
发明人 |
KANEKO MIYAKO;FUJII YASUSHI;SEKIGUCHI KENJI |
分类号 |
B08B3/08;B08B7/04 |
主分类号 |
B08B3/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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