发明名称 |
SIDEWALL IMAGE TRANSFER PITCH DOUBLING AND INLINE CRITICAL DIMENSION SLIMMING |
摘要 |
A method for patterning a substrate is described. The patterning method may include performing a lithographic process to produce a pattern and a critical dimension (CD) slimming process to reduce a CD in the pattern to a reduced CD. Thereafter, the pattern is doubled to produce a double pattern using a sidewall image transfer technique.
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申请公布号 |
US2012128935(A1) |
申请公布日期 |
2012.05.24 |
申请号 |
US201113158899 |
申请日期 |
2011.06.13 |
申请人 |
DUNN SHANNON W.;HETZER DAVE;TOKYO ELECTRON LIMITED |
发明人 |
DUNN SHANNON W.;HETZER DAVE |
分类号 |
B32B3/30;G03F7/20 |
主分类号 |
B32B3/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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