发明名称 |
POSITIONING SYSTEM, A LITHOGRAPHIC APPARATUS AND A METHOD FOR POSITIONAL CONTROL |
摘要 |
A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate. |
申请公布号 |
US2012127451(A1) |
申请公布日期 |
2012.05.24 |
申请号 |
US201113301505 |
申请日期 |
2011.11.21 |
申请人 |
BUTLER HANS;COX HENRIKUS HERMAN MARIE;ASML NETHERLANDS B.V. |
发明人 |
BUTLER HANS;COX HENRIKUS HERMAN MARIE |
分类号 |
G03B27/58 |
主分类号 |
G03B27/58 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|