| 摘要 |
PURPOSE: An optical detection module for a wafer test is provided to improve detection accuracy by mapping a wafer image through a plurality of image sensors which is effectively arranged. CONSTITUTION: A beam splitter(100) irradiates illumination to a test object wafer and divides a wafer image which is reflected. A prism unit(110) determines a progressive direction by penetrating and reflecting each wafer image which is divided by the beam splitter. A first detector gets the wafer image which is penetrated and reflected. The first detector is composed of a plurality of image sensors which respectively obtains an image area. A second detector is composed of a plurality of image sensors which obtains the rest area except for the image area obtained through the first detector.
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