发明名称 Horizontal type contactless deposition apparatus
摘要 PURPOSE: A horizontal contactless deposition apparatus is provided to be easily loaded on a base by a roller of a load lock chamber, thereby increasing the efficiency of a deposition process. CONSTITUTION: A deposition chamber(8) performs a deposition process. A conveyor(9) conveys a substrate in the deposition chamber. A base(10) is formed on the bottom of the deposition chamber. A first support unit is made of a permanent magnet(60) and a magnetic plate(50). A second support unit is formed between the base and the conveyor.
申请公布号 KR101146915(B1) 申请公布日期 2012.05.22
申请号 KR20090115095 申请日期 2009.11.26
申请人 发明人
分类号 H01L21/677;B65G49/06;C23C14/00;H01L21/20 主分类号 H01L21/677
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