| 摘要 |
PURPOSE: The optimization flows of a source, a mask, and a projection optic device are provided to improve a lithographic projection apparatus by minimizing a cost function suitable for design variables. CONSTITUTION: A design layout is obtained(402). A sub set of patterns is selected from one part of the design layout. An initial illumination source is selected. The sub set and illumination source of the patterns are simultaneously optimized. The properties of projection optic devices are optimized by using the optimized illumination source. |
