METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing a semiconductor device capable of accurately and effectively forming patterns.

SOLUTION: A method of manufacturing a semiconductor device comprises steps of: forming a plurality of dummy line patterns 21c disposed at a first pitch on a ground region; forming closed loop-shaped mask patterns 25c that have predetermined mask portions formed on both long side surfaces of the dummy line patterns 21c and surround the dummy line patterns; removing the dummy line patterns 21c; removing the both sides of the mask patterns 25c to leave the predetermined mask portions; and etching the ground region by using the predetermined mask portions as a mask.

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